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1 Ergebnisse
1
Optimization of Scatterometry Measurements by Enhancing wit..:
, In:
2024 35th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
,
Srichandan, Sasmita
;
Heider, Franz
;
Ehrentraut, Georg
... - p. 01-06 , 2024
Link:
https://doi.org/10.1109/ASMC61125.2024.10545495
RT T1 <cTitle>2024 35th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)</cTitle>: T1 <Title>Optimization of Scatterometry Measurements by Enhancing with Machine Learning AM: Advanced Metrology</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-10545495&Exemplar=1&LAN=DE A1 Srichandan, Sasmita A1 Heider, Franz A1 Ehrentraut, Georg A1 Lilje, Stephan A1 Putzi, Christian A1 Radosavljevic, Sanja A1 Sakalauskas, Egidijus YR 2024 SN 2376-6697 K1 Semiconductor device modeling K1 Semiconductor device measurement K1 Scanning electron microscopy K1 Radar measurements K1 Shape measurement K1 Machine learning K1 Semiconductor device manufacture K1 Topics K1 spectral reflectometry K1 scatterometry K1 trench shape K1 CD K1 OCD K1 RCWA K1 recess depth SP 01 OP 06 LK http://dx.doi.org/https://doi.org/10.1109/ASMC61125.2024.10545495 DO https://doi.org/10.1109/ASMC61125.2024.10545495 SF ELIB - SuUB Bremen
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