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1 Ergebnisse
1
Novel Chemical Development for Post Metal Etch Clean:
, In:
2024 35th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
,
Covolo-Whitesell, Lynn
;
Han, Yve
;
Patil, Sushil
... - p. 01-04 , 2024
Link:
https://doi.org/10.1109/ASMC61125.2024.10545499
RT T1 <cTitle>2024 35th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)</cTitle>: T1 <Title>Novel Chemical Development for Post Metal Etch Clean</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-10545499&Exemplar=1&LAN=DE A1 Covolo-Whitesell, Lynn A1 Han, Yve A1 Patil, Sushil A1 Alamgir, Zahir A1 Freeman, Devin A1 Jira, Nicholas A1 Kiehl, Lukas A1 Lakshminarayanamurthy, Sanjna A1 Sundaramoorthy, Nirmal A1 Singh, Satish A1 Sih, Vincent A1 Shinomura, Hisashi A1 Kajiki, Yoshiyuku A1 Kamo, Satoshi A1 Kawahara, Koji A1 Tano, Hiroyuki YR 2024 SN 2376-6697 K1 Performance evaluation K1 Manufacturing processes K1 Toxic chemicals K1 Metals K1 Semiconductor device manufacture K1 Data collection K1 Cleaning SP 01 OP 04 LK http://dx.doi.org/https://doi.org/10.1109/ASMC61125.2024.10545499 DO https://doi.org/10.1109/ASMC61125.2024.10545499 SF ELIB - SuUB Bremen
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