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1 Ergebnisse
1
Contact Optimization Through Annealing and Edge Functionali..:
, In:
2024 International VLSI Symposium on Technology, Systems and Applications (VLSI TSA)
,
Li, Meng-Zhan
;
Hung, Terry Y.T.
;
Yun, Wei Sheng
... - p. 1-2 , 2024
Link:
https://doi.org/10.1109/VLSITSA60681.2024.10546402
RT T1 <cTitle>2024 International VLSI Symposium on Technology, Systems and Applications (VLSI TSA)</cTitle>: T1 <Title>Contact Optimization Through Annealing and Edge Functionalization Towards 2D TMD Nanosheet Devices</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-10546402&Exemplar=1&LAN=DE A1 Li, Meng-Zhan A1 Hung, Terry Y.T. A1 Yun, Wei Sheng A1 Chou, Sui An A1 Hsu, Chen-Feng A1 Lee, T.Y. A1 Cheng, Chao-Ching A1 Radu, Iuliana P. A1 Lin, Minn-Tsong YR 2024 K1 Annealing K1 Very large scale integration K1 Nanoscale devices K1 Plasmas K1 Nitrogen K1 Optimization SP 1 OP 2 LK http://dx.doi.org/https://doi.org/10.1109/VLSITSA60681.2024.10546402 DO https://doi.org/10.1109/VLSITSA60681.2024.10546402 SF ELIB - SuUB Bremen
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