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1 Ergebnisse
1
Characterization of Structural and Dielectric Properties of..:
, In:
2024 IEEE 5th International Conference on Dielectrics (ICD)
,
Al Moussi, T.
;
O'Dalaigh, C.
;
Esvan, J.
... - p. 1-4 , 2024
Link:
https://doi.org/10.1109/ICD59037.2024.10613222
RT T1 <cTitle>2024 IEEE 5th International Conference on Dielectrics (ICD)</cTitle>: T1 <Title>Characterization of Structural and Dielectric Properties of Silicon Nitride Thin Films Deposited by PECVD</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-10613222&Exemplar=1&LAN=DE A1 Al Moussi, T. A1 O'Dalaigh, C. A1 Esvan, J. A1 Lambkin, P. A1 Lakshmanan, R. A1 Chen, B. A1 Diaham, S. YR 2024 SN 2834-8311 K1 Spectroscopy K1 Films K1 Refractive index K1 Silicon nitride K1 Conductivity K1 Dielectric loss measurement K1 Conductivity measurement K1 SiNx K1 Thin-film K1 PECVD K1 Dielectric properties K1 High voltage SP 1 OP 4 LK http://dx.doi.org/https://doi.org/10.1109/ICD59037.2024.10613222 DO https://doi.org/10.1109/ICD59037.2024.10613222 SF ELIB - SuUB Bremen
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