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Backside Power Distribution for Nanosheet Technologies Beyo..:

, In: 2024 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits),

Xie, Ruilong ; Hong, Wonhyuk ; Zhang, Chen... - p. 1-2 , 2024

Link: https://doi.org/10.1109/VLSITechnologyandCir46783.2024..

RT 
T1 <cTitle>2024 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)</cTitle>: T1 <Title>Backside Power Distribution for Nanosheet Technologies Beyond 2nm</Title>

UL https://suche.suub.uni-bremen.de/peid=ieee-10631449&Exemplar=1&LAN=DE
				
A1 Xie, Ruilong
A1 Hong, Wonhyuk
A1 Zhang, Chen
A1 Lee, Jongjin
A1 Brew, Kevin
A1 Johnson, Richard
A1 Lanzillo, Nicholas
A1 Shobha, Hosadurga
A1 Kim, Taesun
A1 Park, Panjae
A1 Mochizuki, Shogo
A1 Saraf, Iqbal
A1 Park, Chanro
A1 Zhuang, Lei
A1 Osborn, Clifford
A1 Li, Wai Kin
A1 Liu, Feng
A1 Sankarapandian, Muthumanickam
A1 Yang, Chung Ju
A1 Li, Juntao
A1 Tierney, Lukas
A1 Pujari, Ruturaj
A1 Sulehria, Yasir
A1 Song, Yuncheng
A1 Zhou, Huimei
A1 Wang, Miaomiao
A1 Belyansky, Michael
A1 Ghosh, Somnath
A1 Zhang, Haojun
A1 Motoyama, Koichi
A1 Sarkar, Debarghya
A1 Kim, Wukang
A1 Chu, Albert
A1 Li, Tao
A1 Carta, Fabio
A1 Gluschenkov, Oleg
A1 Oh, Joongsuk
A1 Malley, Matthew
A1 Chu, Pinlei
A1 Nguyen, Son
A1 Luedders, Katherine
A1 Lee, Joe
A1 Khan, Shahrukh
A1 Chowdhury, Prabudhya Roy
A1 Huang, Huai
A1 Shadman, Abir
A1 Sieg, Stuart
A1 Dechene, Daniel
A1 Edelstein, Daniel
A1 Arnold, John
A1 Yamashita, Tenko
A1 Choi, Kisik
A1 Seo, Kang-ill
A1 Guo, Dechao
A1 Bu, Huiming
YR 2024
SN 2158-9682
K1 Rails
K1 Resistance
K1 Power supplies
K1 Power distribution
K1 Voltage
K1 Very large scale integration
K1 Logic gates
SP 1
OP 2
LK http://dx.doi.org/https://doi.org/10.1109/VLSITechnologyandCir46783.2024.10631449
DO https://doi.org/10.1109/VLSITechnologyandCir46783.2024.10631449
SF ELIB - SuUB Bremen

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