I agree that this site is using cookies. You can find further informations
here
.
X
Login
Merkliste (
0
)
Home
About us
Home About us
Our history
Profile
Press & public relations
Friends
The library in figures
Exhibitions
Projects
Training, internships, careers
Films
Services & Information
Home Services & Information
Lending and interlibrary loans
Returns and renewals
Training and library tours
My Account
Library cards
New to the library?
Download Information
Opening hours
Learning spaces
PC, WLAN, copy, scan and print
Catalogs and collections
Home Catalogs and Collections
Rare books and manuscripts
Digital collections
Subject Areas
Our sites
Home Our sites
Central Library
Law Library (Juridicum)
BB Business and Economics (BB11)
BB Physics and Electrical Engineering
TB Engineering and Social Sciences
TB Economics and Nautical Sciences
TB Music
TB Art & Design
TB Bremerhaven
Contact the library
Home Contact the library
Staff Directory
Open access & publishing
Home Open access & publishing
Reference management: Citavi & RefWorks
Publishing documents
Open Access in Bremen
zur Desktop-Version
Toggle navigation
Merkliste
1 Ergebnisse
1
Replacement Metal Gate Process Extendible Beyond 2-nm Node ..:
, In:
2024 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)
,
Yoshida, Naomi
;
Fisher, Ilanit
;
Ren, He
... - p. 1-2 , 2024
Link:
https://doi.org/10.1109/VLSITechnologyandCir46783.2024..
RT T1 <cTitle>2024 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)</cTitle>: T1 <Title>Replacement Metal Gate Process Extendible Beyond 2-nm Node with Superior Gate Conductivity</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-10631470&Exemplar=1&LAN=DE A1 Yoshida, Naomi A1 Fisher, Ilanit A1 Ren, He A1 Lin, Chi-Chou A1 Shen, Chenfei A1 Lin, Yongjing A1 Xu, Yi A1 Chen, Michael S-.C. A1 Naik, Mehul YR 2024 SN 2158-9682 K1 Performance evaluation K1 Degradation K1 Technological innovation K1 Tungsten K1 Logic gates K1 Conductivity K1 Very large scale integration SP 1 OP 2 LK http://dx.doi.org/https://doi.org/10.1109/VLSITechnologyandCir46783.2024.10631470 DO https://doi.org/10.1109/VLSITechnologyandCir46783.2024.10631470 SF ELIB - SuUB Bremen
Export
RefWorks (nur Desktop-Version!)
Flow
(Zuerst in
Flow
einloggen, dann importieren)
