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1 Ergebnisse
1
In-depth Analysis of the Hafnia Ferroelectrics as a Key Ena..:
, In:
2024 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)
,
Kim, Giuk
;
Choi, Hyojun
;
Shin, Hunbeom
... - p. 1-2 , 2024
Link:
https://doi.org/10.1109/VLSITechnologyandCir46783.2024..
RT T1 <cTitle>2024 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)</cTitle>: T1 <Title>In-depth Analysis of the Hafnia Ferroelectrics as a Key Enabler for Low Voltage & QLC 3D VNAND Beyond 1K Layers: Experimental Demonstration and Modeling</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-10631559&Exemplar=1&LAN=DE A1 Kim, Giuk A1 Choi, Hyojun A1 Shin, Hunbeom A1 Lee, Sangho A1 Lee, Sangmok A1 Nam, Yunseok A1 Jung, Minhyun A1 Myeong, Ilho A1 Kim, Kijoon A1 Woo, Jongho A1 Lim, Suhwan A1 Kim, Kwangsoo A1 Kim, Wanki A1 Ha, Daewon A1 Ahn, Jinho A1 Jeon, Sanghun YR 2024 SN 2158-9682 K1 Solid modeling K1 Analytical models K1 Low voltage K1 Three-dimensional displays K1 Voltage K1 Switches K1 Very large scale integration SP 1 OP 2 LK http://dx.doi.org/https://doi.org/10.1109/VLSITechnologyandCir46783.2024.10631559 DO https://doi.org/10.1109/VLSITechnologyandCir46783.2024.10631559 SF ELIB - SuUB Bremen
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