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1 Ergebnisse
1
Investigation of HfO2 and ZrO2 Nanolamination Thickness on ..:
, In:
2024 IEEE Silicon Nanoelectronics Workshop (SNW)
,
Hsieh, Dong-Ru
;
Hong, Zi-Yang
;
Yeh, Wei-Ju
... - p. 31-32 , 2024
Link:
https://doi.org/10.1109/SNW63608.2024.10639221
RT T1 <cTitle>2024 IEEE Silicon Nanoelectronics Workshop (SNW)</cTitle>: T1 <Title>Investigation of HfO2 and ZrO2 Nanolamination Thickness on Superlattice HZO FeRAMs Exhibiting Enhanced Remnant Polarization and Improved Endurance</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-10639221&Exemplar=1&LAN=DE A1 Hsieh, Dong-Ru A1 Hong, Zi-Yang A1 Yeh, Wei-Ju A1 Ni, Jia-Chian A1 Luo, Huai-En A1 Liang, Yan-Kui A1 Hsieh, Shang-Lin A1 Chen, Kuan-Lin A1 Chao, Tien-Sheng YR 2024 SN 2161-4644 K1 Nonvolatile memory K1 Ferroelectric films K1 Conferences K1 Random access memory K1 Superlattices K1 Hafnium oxide K1 Fatigue SP 31 OP 32 LK http://dx.doi.org/https://doi.org/10.1109/SNW63608.2024.10639221 DO https://doi.org/10.1109/SNW63608.2024.10639221 SF ELIB - SuUB Bremen
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