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The distribution of boron and arsenic in SOI wafers impleme..:

, In: Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on,
Mulcahy, C. ; Biswas, S. ; Kelly, I... - p. 1-4 , 2002
Link: https://doi.org/10.1109/IIT.2002.1278881