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1 Ergebnisse
1
80nm self-aligned complementary I-MOS using double sidewall..:
, In:
IEDM Technical Digest. IEEE International Electron Devices Meeting, 2004.
,
Woo Young Choi
;
Jae Young Song
;
Byung Yong Choi
... - p. 203,204,205,206 , 2004
Link:
https://doi.org/10.1109/IEDM.2004.1419108
RT T1
IEDM Technical Digest. IEEE International Electron Devices Meeting, 2004.
: T1
80nm self-aligned complementary I-MOS using double sidewall spacer and elevated drain structure and its applicability to amplifiers with high linearity
UL https://suche.suub.uni-bremen.de/peid=ieee-1419108&Exemplar=1&LAN=DE A1 Woo Young Choi A1 Jae Young Song A1 Byung Yong Choi A1 Jong Duk Lee A1 Young June Park A1 Byung-Gook Park YR 2004 K1 Linearity K1 MOSFETs K1 Fabrication K1 Threshold voltage K1 PIN photodiodes K1 Semiconductor optical amplifiers K1 Physics K1 Temperature distribution K1 Rapid thermal processing K1 Rapid thermal annealing SP 203,204,205,206 LK http://dx.doi.org/https://doi.org/10.1109/IEDM.2004.1419108 DO https://doi.org/10.1109/IEDM.2004.1419108 SF ELIB - SuUB Bremen
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