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1 Ergebnisse
1
Study on 0.1 micron grooved-gate CMOS:
, In:
Proceedings. 7th International Conference on Solid-State and Integrated Circuits Technology, 2004.
,
Xiao-Ju Zhang
;
Xiao-Hua Ma
;
Hong-Xia Ren
.. - p. 126,127,128,129 , 2004
Link:
https://doi.org/10.1109/ICSICT.2004.1434969
RT T1
Proceedings. 7th International Conference on Solid-State and Integrated Circuits Technology, 2004.
: T1
Study on 0.1 micron grooved-gate CMOS
UL https://suche.suub.uni-bremen.de/peid=ieee-1434969&Exemplar=1&LAN=DE A1 Xiao-Ju Zhang A1 Xiao-Hua Ma A1 Hong-Xia Ren A1 Yue Hao A1 Bao-Gang Sun YR 2004 K1 MOSFET circuits K1 CMOS technology K1 Fabrication K1 Oxidation K1 Etching K1 CMOS process K1 Microelectronics K1 Threshold voltage K1 Doping K1 MOS devices SP 126,127,128,129 LK http://dx.doi.org/https://doi.org/10.1109/ICSICT.2004.1434969 DO https://doi.org/10.1109/ICSICT.2004.1434969 SF ELIB - SuUB Bremen
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