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Process development of negative tone dry film photoresist f..:

, In: Proceedings. 7th International Conference on Solid-State and Integrated Circuits Technology, 2004.,
Shan Xue Chuan ; Jin Yufeng ; Lu Haijing. - p. 575,576,577,578 , 2004
Link: https://doi.org/10.1109/ICSICT.2004.1435072