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Analytical Modeling and Simulation of V/sub th/ and V/sub t..:
, In:
2005 International Semiconductor Device Research Symposium
,
Alam, Mohmmad T.
;
Rahman, Touhidur
;
Islam, Syed K.
. - p. 336,337 , 2005
Link:
https://doi.org/10.1109/ISDRS.2005.1596123
RT T1
2005 International Semiconductor Device Research Symposium
: T1
Analytical Modeling and Simulation of V/sub th/ and V/sub tl/ of the Delta-Doped MOS-Gate Si/SiGe HEMT
UL https://suche.suub.uni-bremen.de/peid=ieee-1596123&Exemplar=1&LAN=DE A1 Alam, Mohmmad T. A1 Rahman, Touhidur A1 Islam, Syed K. A1 Hasanuzzaman, Md. YR 2005 K1 Analytical models K1 Silicon germanium K1 Germanium silicon alloys K1 HEMTs K1 Threshold voltage K1 Semiconductor process modeling K1 Cutoff frequency K1 Doping K1 Transconductance K1 Medical simulation SP 336,337 LK http://dx.doi.org/https://doi.org/10.1109/ISDRS.2005.1596123 DO https://doi.org/10.1109/ISDRS.2005.1596123 SF ELIB - SuUB Bremen
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