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Integration of multi-level self-aligned CoWP barrier compat..:
, In:
2006 International Interconnect Technology Conference
,
Chhun, S.
;
Margain, A.
;
Guillan, J.
... - p. 33-35 , 2006
Link:
https://doi.org/10.1109/IITC.2006.1648638
RT T1
2006 International Interconnect Technology Conference
: T1
Integration of multi-level self-aligned CoWP barrier compatible with high performance BEOL
UL https://suche.suub.uni-bremen.de/peid=ieee-1648638&Exemplar=1&LAN=DE A1 Chhun, S. A1 Margain, A. A1 Guillan, J. A1 Gras, R. A1 Dupuy, J.-C. A1 Torres, J. A1 Gosset, L.G. A1 Besling, W. A1 Vanypre, T. A1 Brun, Ph. A1 Ollier, E. A1 Mellier, M. A1 Imbert, G. A1 Jullian, S. YR 2006 SN 2380-632X SN 2380-6338 K1 Dielectrics K1 Atherosclerosis K1 Metallization K1 Etching K1 Leakage current K1 Chemical technology K1 Inorganic materials K1 Chemistry K1 Electromigration K1 Protection SP 33 OP 35 LK http://dx.doi.org/https://doi.org/10.1109/IITC.2006.1648638 DO https://doi.org/10.1109/IITC.2006.1648638 SF ELIB - SuUB Bremen
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