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Modeling and minimization of PMOS NBTI effect for robust na..:
, In:
2006 43rd ACM/IEEE Design Automation Conference
,
Vattikonda, R.
;
Wenping Wang
;
Yu Cao
- p. 1047-1052 , 2006
Link:
https://doi.org/10.1145/1146909.1147172
RT T1
2006 43rd ACM/IEEE Design Automation Conference
: T1
Modeling and minimization of PMOS NBTI effect for robust nanometer design
UL https://suche.suub.uni-bremen.de/peid=ieee-1688953&Exemplar=1&LAN=DE A1 Vattikonda, R. A1 Wenping Wang A1 Yu Cao YR 2006 SN 0738-100X K1 Niobium compounds K1 Titanium compounds K1 Robustness K1 Degradation K1 Circuit optimization K1 Minimization K1 Negative bias temperature instability K1 MOSFETs K1 Predictive models K1 Scalability K1 Performance K1 Design K1 Reliability K1 Experimentation K1 NBTI K1 Threshold Voltage K1 Temperature K1 Performance Degradation K1 Variability SP 1047 OP 1052 LK http://dx.doi.org/https://doi.org/10.1145/1146909.1147172 DO https://doi.org/10.1145/1146909.1147172 SF ELIB - SuUB Bremen
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