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1
Trap Layer Engineered FinFET NAND Flash with Enhanced Memor..:
, In:
2006 Symposium on VLSI Technology, 2006. Digest of Technical Papers.
,
Ahn, Y.
;
Cheong, S.
;
Lee, D.
... - p. 88-89 , 2006
Link:
https://doi.org/10.1109/VLSIT.2006.1705230
RT T1
2006 Symposium on VLSI Technology, 2006. Digest of Technical Papers.
: T1
Trap Layer Engineered FinFET NAND Flash with Enhanced Memory Window
UL https://suche.suub.uni-bremen.de/peid=ieee-1705230&Exemplar=1&LAN=DE A1 Ahn, Y. A1 Cheong, S. A1 Lee, D. A1 Kim, S. A1 Park, D. A1 Ryu, B.-I. A1 Choe, J.-D. A1 Lee, J. A1 Choi, D. A1 Cho, E. A1 Choi, B. A1 Lee, S.-H. A1 Sung, S.-K. A1 Lee, C.-H. YR 2006 SN 0743-1562 SN 2158-9682 K1 FinFETs K1 Electron traps K1 Manufacturing processes K1 Pulp manufacturing K1 Semiconductor device manufacture K1 Research and development K1 High K dielectric materials K1 High-K gate dielectrics K1 Dielectric devices K1 Nanoscale devices SP 88 OP 89 LK http://dx.doi.org/https://doi.org/10.1109/VLSIT.2006.1705230 DO https://doi.org/10.1109/VLSIT.2006.1705230 SF ELIB - SuUB Bremen
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