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1 Ergebnisse
1
Improved 1/f Noise Characteristics in Locally Strained Si C..:
, In:
2006 Symposium on VLSI Technology, 2006. Digest of Technical Papers.
,
Ueno, T.
;
Lee, Cheol Kyu
;
Bae, G.-J.
... - p. 104-105 , 2006
Link:
https://doi.org/10.1109/VLSIT.2006.1705238
RT T1
2006 Symposium on VLSI Technology, 2006. Digest of Technical Papers.
: T1
Improved 1/f Noise Characteristics in Locally Strained Si CMOS Using Hydrogen-Controlled Stress Liners and Embedded SiGe
UL https://suche.suub.uni-bremen.de/peid=ieee-1705238&Exemplar=1&LAN=DE A1 Ueno, T. A1 Lee, Cheol Kyu A1 Bae, G.-J. A1 Lee, N.-I. A1 Rhee, H. A1 Lee, H. A1 Kim, M. A1 Cho, H. A1 Baik, H. A1 Jung, Y. A1 Lee, Hyun Woo A1 Park, H. YR 2006 SN 0743-1562 SN 2158-9682 K1 Silicon germanium K1 Germanium silicon alloys K1 Compressive stress K1 Hydrogen K1 Noise reduction K1 Noise generators K1 MOS devices K1 Weight control K1 Stress control K1 Interface states SP 104 OP 105 LK http://dx.doi.org/https://doi.org/10.1109/VLSIT.2006.1705238 DO https://doi.org/10.1109/VLSIT.2006.1705238 SF ELIB - SuUB Bremen
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