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Dual High-k Gate Dielectric Technology Using Selective AlOx..:

, In: 2006 Symposium on VLSI Technology, 2006. Digest of Technical Papers.,
Jung, H.-S. ; Chung, Y. ; Kim, S.... - p. 162-163 , 2006
Link: https://doi.org/10.1109/VLSIT.2006.1705267