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1 Ergebnisse
1
Process Induced Instability and Reliability Issues in Low T..:
, In:
2006 IEEE International Reliability Physics Symposium Proceedings
,
Chen, Chih-yang
;
Wang, Shen-de
;
Shieh, Ming-shan
... - p. None , 2006
Link:
https://doi.org/10.1109/RELPHY.2006.251338
RT T1 <cTitle>2006 IEEE International Reliability Physics Symposium Proceedings</cTitle>: T1 <Title>Process Induced Instability and Reliability Issues in Low Temperature Poly-Si Thin Film Transistors</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-4017279&Exemplar=1&LAN=DE A1 Chen, Chih-yang A1 Wang, Shen-de A1 Shieh, Ming-shan A1 Chen, Wei-cheng A1 Lin, Hsiao-Yi A1 Yeh, Kuan-lin A1 Lee, Jam-wen A1 Lei, Tan-fu YR 2006 SN 1541-7026 SN 1938-1891 K1 Thin film transistors K1 Stress K1 Plasma devices K1 Plasma temperature K1 Plasma applications K1 Hot carriers K1 Plasma properties K1 Degradation K1 Plasma materials processing K1 Electron traps K1 LTPS TFTs K1 antenna area K1 gate bias stress K1 hot carrier stress SP None LK http://dx.doi.org/https://doi.org/10.1109/RELPHY.2006.251338 DO https://doi.org/10.1109/RELPHY.2006.251338 SF ELIB - SuUB Bremen
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