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1 Ergebnisse
1
Applications of SiGe Material for CMOS and Related Processi..:
, In:
2006 Bipolar/BiCMOS Circuits and Technology Meeting
,
Monfray, S.
;
Skotnicki, T.
;
Coronel, P.
... - p. None , 2006
Link:
https://doi.org/10.1109/BIPOL.2006.311144
RT T1
2006 Bipolar/BiCMOS Circuits and Technology Meeting
: T1
Applications of SiGe Material for CMOS and Related Processing
UL https://suche.suub.uni-bremen.de/peid=ieee-4100212&Exemplar=1&LAN=DE A1 Monfray, S. A1 Skotnicki, T. A1 Coronel, P. A1 Harrison, S. A1 Chanemougame, D. A1 Payet, F. A1 Dutartre, D. A1 Talbot, A. A1 Borel, S. YR 2006 SN 1088-9299 SN 2378-590X K1 Silicon germanium K1 Germanium silicon alloys K1 CMOS process K1 Crystalline materials K1 Heterojunction bipolar transistors K1 Boosting K1 Germanium alloys K1 Photonic band gap K1 Crystallization K1 Etching K1 SiGe K1 Ge K1 Strain K1 heterostructures K1 selective SiGe etching K1 Silicon On Nothing K1 Fully depleted devices K1 Double Gate devices SP None LK http://dx.doi.org/https://doi.org/10.1109/BIPOL.2006.311144 DO https://doi.org/10.1109/BIPOL.2006.311144 SF ELIB - SuUB Bremen
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