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Robust integration of an ULK SiOCH dielectric (k=2.3) for h..:

, In: 2007 IEEE International Interconnect Technology Conferencee,
Aimadeddine, M. ; Maury, P. ; Delaye, V.... - p. None , 2007
Link: https://doi.org/10.1109/IITC.2007.382382