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1 Ergebnisse
1
Improved Bake Retention Characteristic of Recessed Charge T..:
, In:
2007 22nd IEEE Non-Volatile Semiconductor Memory Workshop
,
Lee, Se Hoon
;
Kim, Woo-Jung
;
Yoon, Young-Bae
... - p. None , 2007
Link:
https://doi.org/10.1109/NVSMW.2007.4290599
RT T1
2007 22nd IEEE Non-Volatile Semiconductor Memory Workshop
: T1
Improved Bake Retention Characteristic of Recessed Charge Trap Flash (RCTF)
UL https://suche.suub.uni-bremen.de/peid=ieee-4290599&Exemplar=1&LAN=DE A1 Lee, Se Hoon A1 Kim, Woo-Jung A1 Yoon, Young-Bae A1 Park, Kyucharn A1 Lee, Jong Jin A1 Jang, Donghoon A1 Choe, Jeong-Dong A1 Kim, Taeyong A1 Cho, Eun Suk A1 Park, Se Joon A1 Ahn, Young Joon A1 Hwang, Won YR 2007 SN 2159-483X SN 2159-4864 K1 FinFETs K1 Silicon compounds K1 Aluminum oxide K1 Etching K1 SONOS devices K1 Dielectrics K1 Electron traps K1 Research and development K1 Electronic mail K1 Transistors SP None LK http://dx.doi.org/https://doi.org/10.1109/NVSMW.2007.4290599 DO https://doi.org/10.1109/NVSMW.2007.4290599 SF ELIB - SuUB Bremen
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