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1 Ergebnisse
1
Novel, Effective and Cost-Efficient Method of Introducing F..:
, In:
2007 IEEE Symposium on VLSI Technology
,
Shickova, A.
;
Leys, F.
;
Boullart, W.
... - p. None , 2007
Link:
https://doi.org/10.1109/VLSIT.2007.4339748
RT T1
2007 IEEE Symposium on VLSI Technology
: T1
Novel, Effective and Cost-Efficient Method of Introducing Fluorine into Metal/Hf-based Gate Stack in MuGFET and Planar SOI Devices with Significant BTI Improvement
UL https://suche.suub.uni-bremen.de/peid=ieee-4339748&Exemplar=1&LAN=DE A1 Shickova, A. A1 Leys, F. A1 Boullart, W. A1 Franquet, A. A1 Kaczer, B. A1 Jurczak, M. A1 Maes, H. A1 Groeseneken, G. A1 Collaert, N. A1 Zimmerman, P. A1 Demand, M. A1 Simoen, E. A1 Pourtois, G. A1 De Keersgieter, A. A1 Trojman, L. A1 Ferain, I. YR 2007 SN 0743-1562 SN 2158-9682 K1 Sulfur hexafluoride K1 Passivation K1 Etching K1 Chemistry K1 Degradation K1 MOS devices K1 High-K gate dielectrics K1 Stress K1 Dielectric devices K1 Tin SP None LK http://dx.doi.org/https://doi.org/10.1109/VLSIT.2007.4339748 DO https://doi.org/10.1109/VLSIT.2007.4339748 SF ELIB - SuUB Bremen
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