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1 Ergebnisse
1
Aggressively Scaled High-k Gate Dielectric with Excellent P..:
, In:
2007 IEEE International Electron Devices Meeting
,
Sivasubramani, P.
;
Harris, R.
;
Song, S.C.
... - p. None , 2007
Link:
https://doi.org/10.1109/IEDM.2007.4418995
RT T1
2007 IEEE International Electron Devices Meeting
: T1
Aggressively Scaled High-k Gate Dielectric with Excellent Performance and High Temperature Stability for 32nm and Beyond
UL https://suche.suub.uni-bremen.de/peid=ieee-4418995&Exemplar=1&LAN=DE A1 Sivasubramani, P. A1 Harris, R. A1 Song, S.C. A1 Heh, D. A1 Choi, R. A1 Majhi, P. A1 Bersuker, G. A1 Lysaght, P. A1 Lee, B.H. A1 Tseng, H.-H. A1 Jur, J. S. A1 Kirsch, P.D. A1 Lichtenwalner, D. J. A1 Kingon, A. I. A1 Jammy, R. A1 Huang, J. A1 Park, C. A1 Tan, Y.N. A1 Gilmer, D.C. A1 Young, C. A1 Freeman, K. A1 Hussain, M.M. YR 2007 SN 0163-1918 SN 2156-017X K1 Stability K1 Stress K1 Doping K1 Dielectric materials K1 Plasma temperature K1 Thermodynamics K1 Dielectric breakdown K1 Amorphous materials K1 Semiconductor process modeling K1 Thickness control SP None LK http://dx.doi.org/https://doi.org/10.1109/IEDM.2007.4418995 DO https://doi.org/10.1109/IEDM.2007.4418995 SF ELIB - SuUB Bremen
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