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1 Ergebnisse
1
Etching of copper in deionized water rinse:
, In:
2008 15th International Symposium on the Physical and Failure Analysis of Integrated Circuits
,
Gambino, J.
;
Wenner, M
;
McDevitt, T.
... - p. None , 2008
Link:
https://doi.org/10.1109/IPFA.2008.4588209
RT T1
2008 15th International Symposium on the Physical and Failure Analysis of Integrated Circuits
: T1
Etching of copper in deionized water rinse
UL https://suche.suub.uni-bremen.de/peid=ieee-4588209&Exemplar=1&LAN=DE A1 Gambino, J. A1 Wenner, M A1 McDevitt, T. A1 Chapple-Sokol, J. A1 Luce, S. A1 Robbins, J. A1 Rutkowski, T. A1 Johnson, C. A1 DeVries, K. A1 Rath, D. A1 Vereecken, P. A1 Walton, E. A1 Porth, B. YR 2008 SN 1946-1542 SN 1946-1550 K1 Copper K1 Corrosion K1 Etching K1 Arrays K1 Metals K1 Junctions K1 Microscopy SP None LK http://dx.doi.org/https://doi.org/10.1109/IPFA.2008.4588209 DO https://doi.org/10.1109/IPFA.2008.4588209 SF ELIB - SuUB Bremen
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