I agree that this site is using cookies. You can find further informations
here
.
X
Login
Merkliste (
0
)
Home
About us
Home About us
Our history
Profile
Press & public relations
Friends
The library in figures
Exhibitions
Projects
Training, internships, careers
Films
Services & Information
Home Services & Information
Lending and interlibrary loans
Returns and renewals
Training and library tours
My Account
Library cards
New to the library?
Download Information
Opening hours
Learning spaces
PC, WLAN, copy, scan and print
Catalogs and collections
Home Catalogs and Collections
Rare books and manuscripts
Digital collections
Subject Areas
Our sites
Home Our sites
Central Library
Law Library (Juridicum)
BB Business and Economics (BB11)
BB Physics and Electrical Engineering
TB Engineering and Social Sciences
TB Economics and Nautical Sciences
TB Music
TB Art & Design
TB Bremerhaven
Contact the library
Home Contact the library
Staff Directory
Open access & publishing
Home Open access & publishing
Reference management: Citavi & RefWorks
Publishing documents
Open Access in Bremen
zur Desktop-Version
Toggle navigation
Merkliste
1 Ergebnisse
1
Ion implantation technology and system for beyond 45nm node..:
, In:
2008 9th International Conference on Solid-State and Integrated-Circuit Technology
,
Tanjyo, Masayasu
;
Nagayama, Tsutomu
;
Hamamoto, Nariaki
... - p. None , 2008
Link:
https://doi.org/10.1109/ICSICT.2008.4734791
RT T1 <cTitle>2008 9th International Conference on Solid-State and Integrated-Circuit Technology</cTitle>: T1 <Title>Ion implantation technology and system for beyond 45nm node devices</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-4734791&Exemplar=1&LAN=DE A1 Tanjyo, Masayasu A1 Nagayama, Tsutomu A1 Hamamoto, Nariaki A1 Umisedo, Sei A1 Koga, Yuji A1 Maehara, Noriaki A1 Une, Hideyasu A1 Nogami, Takashi A1 Hino, Masayoshi A1 Kobayashi, Tomoaki A1 Fujita, Hideki A1 Matsumoto, Takao A1 Yoshimura, Yosuke A1 Sakai, Shigeki A1 Nagai, Nobuo YR 2008 K1 Ion implantation K1 Marketing and sales K1 Dielectric materials K1 Transistors K1 Production K1 Costs K1 Semiconductor devices K1 Random access memory K1 Semiconductor materials K1 Cellular phones SP None LK http://dx.doi.org/https://doi.org/10.1109/ICSICT.2008.4734791 DO https://doi.org/10.1109/ICSICT.2008.4734791 SF ELIB - SuUB Bremen
Export
RefWorks (nur Desktop-Version!)
Flow
(Zuerst in
Flow
einloggen, dann importieren)
