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1 Ergebnisse
1
Control of design specific variation in etch-assisted via p..:
, In:
2009 10th International Symposium on Quality Electronic Design
,
Sukharev, Valeriy
;
Markosian, Ara
;
Kteyan, Armen
... - p. None , 2009
Link:
https://doi.org/10.1109/ISQED.2009.4810286
RT T1 <cTitle>2009 10th International Symposium on Quality Electronic Design</cTitle>: T1 <Title>Control of design specific variation in etch-assisted via pattern transfer by means of full-chip simulation</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-4810286&Exemplar=1&LAN=DE A1 Sukharev, Valeriy A1 Markosian, Ara A1 Kteyan, Armen A1 Manukyan, Levon A1 Khachatryan, Nikolay A1 Choy, Jun-Ho A1 Lazaryan, Hasmik A1 Hovsepyan, Henrik A1 Onoue, Seiji A1 Kikuchi, Takuo A1 Kamigaki, Tetsuya YR 2009 SN 1948-3287 SN 1948-3295 K1 Design optimization K1 Dry etching K1 Semiconductor device modeling K1 Process design K1 Algorithm design and analysis K1 Testing K1 Design engineering K1 Physics K1 Standards development K1 Plasma simulation K1 Plasma etch K1 microloading K1 pattern density K1 full-chip K1 simulation SP None LK http://dx.doi.org/https://doi.org/10.1109/ISQED.2009.4810286 DO https://doi.org/10.1109/ISQED.2009.4810286 SF ELIB - SuUB Bremen
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