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Sub-100nm high-K metal gate GeOI pMOSFETs performance: Impa..:

, In: 2009 International Symposium on VLSI Technology, Systems, and Applications,
Le Royer, C. ; Tabone, C. ; Previtali, B.... - p. None , 2009
Link: https://doi.org/10.1109/VTSA.2009.5159331