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Process optimization for preventing boron-penetration using..:

, In: 1995 International Symposium on VLSI Technology, Systems, and Applications. Proceedings of Technical Papers,
Sun, W.T. ; Chen, S.H. ; Lin, C.J... - p. 40,41,42,43 , 1995
Link: https://doi.org/10.1109/VTSA.1995.524630