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Numerical investigations of the strain behavior in nanoscal..:
, In:
2010 11th International Thermal, Mechanical & Multi-Physics Simulation, and Experiments in Microelectronics and Microsystems (EuroSimE)
,
Naumann, F.
;
Moutanabbir, O.
;
Reiche, M.
... - p. 1-5 , 2010
Link:
https://doi.org/10.1109/ESIME.2010.5464522
RT T1 <cTitle>2010 11th International Thermal, Mechanical & Multi-Physics Simulation, and Experiments in Microelectronics and Microsystems (EuroSimE)</cTitle>: T1 <Title>Numerical investigations of the strain behavior in nanoscale patterned strained silicon structures</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-5464522&Exemplar=1&LAN=DE A1 Naumann, F. A1 Moutanabbir, O. A1 Reiche, M. A1 Schriever, C. A1 Schilling, J. A1 Petzold, M. YR 2010 K1 Capacitive sensors K1 Silicon K1 Stress K1 Optical device fabrication K1 Optical waveguides K1 Optical materials K1 Strain control K1 Optical control K1 Engineering profession K1 Optical devices SP 1 OP 5 LK http://dx.doi.org/https://doi.org/10.1109/ESIME.2010.5464522 DO https://doi.org/10.1109/ESIME.2010.5464522 SF ELIB - SuUB Bremen
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