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1 Ergebnisse
1
Effects of cluster carbon implantation at low temperature o..:
, In:
2010 18th International Conference on Advanced Thermal Processing of Semiconductors (RTP)
,
Onoda, Hiroshi
;
Hamamoto, Nariaki
;
Nagayama, Tsutomu
... - p. 72-75 , 2010
Link:
https://doi.org/10.1109/RTP.2010.5623605
RT T1 <cTitle>2010 18th International Conference on Advanced Thermal Processing of Semiconductors (RTP)</cTitle>: T1 <Title>Effects of cluster carbon implantation at low temperature on damage recovery after rapid thermal annealing</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-5623605&Exemplar=1&LAN=DE A1 Onoda, Hiroshi A1 Hamamoto, Nariaki A1 Nagayama, Tsutomu A1 Sakai, Shigeki A1 Tanjyo, Masayasu A1 Umisedo, Sei A1 Koga, Yuji A1 Maehara, Noriaki A1 Kawamura, Yasunori A1 Nakashima, Yoshiki A1 Tanaka, Kouhei A1 Hashino, Yoshikazu A1 Hashimoto, Masahiro A1 Yoshimi, Hideki A1 Sezaki, Shinichi A1 Reyes, Jason A1 Prussin, Simon YR 2010 SN 1944-026X SN 1944-0251 SN 1944-0251 K1 Annealing K1 Substrates K1 Biomedical imaging K1 Electronic mail SP 72 OP 75 LK http://dx.doi.org/https://doi.org/10.1109/RTP.2010.5623605 DO https://doi.org/10.1109/RTP.2010.5623605 SF ELIB - SuUB Bremen
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