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Poly-Si etching in Cl/sub 2/ plasma using electron-beam-exc..:

, In: IEEE Conference Record - Abstracts. 1997 IEEE International Conference on Plasma Science,
Miyani, R. ; Mikawa, Y. ; Inaguma, J.-I.... - p. 232 , 1997
Link: https://doi.org/10.1109/PLASMA.1997.604956