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Thermal stability of thin CoSi2 layers on polysilicon impla..:
, In:
European Workshop Materials for Advanced Metallization,
,
La Via, F.
;
Aberti, A.
;
Raineri, V.
.. - p. 181,182,183 , 1997
Link:
https://doi.org/10.1109/MAM.1997.621112
RT T1 <cTitle>European Workshop Materials for Advanced Metallization,</cTitle>: T1 <Title>Thermal stability of thin CoSi2 layers on polysilicon implanted with As, BF2 and Si</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-621112&Exemplar=1&LAN=DE A1 La Via, F. A1 Aberti, A. A1 Raineri, V. A1 Ravesi, S. A1 Rimini, E. YR 1997 SN 1266-0167 K1 Thermal stability K1 Silicides K1 Substrates K1 Electrical resistance measurement K1 Silicon K1 Annealing K1 Temperature K1 Cobalt K1 Atomic measurements K1 Force measurement SP 181,182,183 LK http://dx.doi.org/https://doi.org/10.1109/MAM.1997.621112 DO https://doi.org/10.1109/MAM.1997.621112 SF ELIB - SuUB Bremen
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