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1 Ergebnisse
1
Cost effective application of advanced computational lithog..:
, In:
ASMC 2013 SEMI Advanced Semiconductor Manufacturing Conference
,
Gek Soon Chua
;
Dover, Russell
;
Xiaolong Zhang
... - p. 1-6 , 2013
Link:
https://doi.org/10.1109/ASMC.2013.6552743
RT T1 <cTitle>ASMC 2013 SEMI Advanced Semiconductor Manufacturing Conference</cTitle>: T1 <Title>Cost effective application of advanced computational lithography techniques using flexible mask optimization</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-6552743&Exemplar=1&LAN=DE A1 Gek Soon Chua A1 Dover, Russell A1 Xiaolong Zhang A1 Bo Yan A1 Yi Zou A1 Wei-Long Wang A1 Qing Yang A1 Shyue Fong Quek A1 Jianhong Qiu A1 Pandey, Taksh A1 Baron, Stanislas A1 Kapasi, Sanjay YR 2013 SN 1078-8743 SN 2376-6697 K1 Maintenance engineering K1 Bridges K1 Resists K1 Stress K1 Layout K1 Neck K1 Runtime K1 FMO K1 MB-SRAF K1 PW-OPC K1 LMC K1 RET K1 Computational Lithography K1 Tachyon K1 MRC SP 1 OP 6 LK http://dx.doi.org/https://doi.org/10.1109/ASMC.2013.6552743 DO https://doi.org/10.1109/ASMC.2013.6552743 SF ELIB - SuUB Bremen
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