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1 Ergebnisse
1
The physics of Cu pillar bump interconnect under electromig..:
, In:
Proceedings of the 5th Electronics System-integration Technology Conference (ESTC)
,
Hsiao, Yu-Hsiang
;
Chen, Chien-Fan
;
Yang, Ping-Feng
... - p. 1-6 , 2014
Link:
https://doi.org/10.1109/ESTC.2014.6962759
RT T1
Proceedings of the 5th Electronics System-integration Technology Conference (ESTC)
: T1
The physics of Cu pillar bump interconnect under electromigration stress testing
UL https://suche.suub.uni-bremen.de/peid=ieee-6962759&Exemplar=1&LAN=DE A1 Hsiao, Yu-Hsiang A1 Chen, Chien-Fan A1 Yang, Ping-Feng A1 Lee, Chang-Chi A1 Liu, Min-Chi A1 Lin, Kwang-Lung A1 Chen, Chiao-Wen A1 Factor, Bradford J. YR 2014 K1 Nickel K1 Testing K1 Flip-chip devices K1 Substrates K1 Electromigration K1 Copper K1 Resistance SP 1 OP 6 LK http://dx.doi.org/https://doi.org/10.1109/ESTC.2014.6962759 DO https://doi.org/10.1109/ESTC.2014.6962759 SF ELIB - SuUB Bremen
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