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1 Ergebnisse
1
Cobalt polishing slurries for 10 nm and beyond:
, In:
Proceedings of International Conference on Planarization/CMP Technology 2014
,
Wang, Luling
;
Mishra, Abhudaya
;
Cruz, Benjamin
. - p. 233-233 , 2014
Link:
https://doi.org/10.1109/ICPT.2014.7017287
RT T1 <cTitle>Proceedings of International Conference on Planarization/CMP Technology 2014</cTitle>: T1 <Title>Cobalt polishing slurries for 10 nm and beyond</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-7017287&Exemplar=1&LAN=DE A1 Wang, Luling A1 Mishra, Abhudaya A1 Cruz, Benjamin A1 Wen, Richard YR 2014 K1 Corrosion K1 Slurries K1 Cobalt K1 Technological innovation K1 Roads K1 Conductivity K1 Tantalum K1 CMP K1 BEOL K1 interconnect K1 defectivity K1 selective slurry K1 tunable K1 high removal rates K1 dielectric SP 233 OP 233 LK http://dx.doi.org/https://doi.org/10.1109/ICPT.2014.7017287 DO https://doi.org/10.1109/ICPT.2014.7017287 SF ELIB - SuUB Bremen
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