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1 Ergebnisse
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A parametric study of ICP-RIE etching on a lithium niobate ..:
, In:
10th IEEE International Conference on Nano/Micro Engineered and Molecular Systems
,
Chang, Chun-Ming
;
Yu, Chih-Sheng
;
Hsieh, Fan-Chun
... - p. 485-486 , 2015
Link:
https://doi.org/10.1109/NEMS.2015.7147473
RT T1 <cTitle>10th IEEE International Conference on Nano/Micro Engineered and Molecular Systems</cTitle>: T1 <Title>A parametric study of ICP-RIE etching on a lithium niobate substrate</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-7147473&Exemplar=1&LAN=DE A1 Chang, Chun-Ming A1 Yu, Chih-Sheng A1 Hsieh, Fan-Chun A1 Lin, Chun-Ting A1 Huang, Tsung-Tao A1 Lin, Ping-Hung A1 Kao, Jiann-Shiun A1 Huang, Tsung-Tao A1 Hsiao, Chien-Nan A1 Shiao, Ming-Hua YR 2015 K1 Etching K1 Lithium niobate K1 Nickel K1 Substrates K1 Iterative closest point algorithm K1 Radio frequency K1 Resists SP 485 OP 486 LK http://dx.doi.org/https://doi.org/10.1109/NEMS.2015.7147473 DO https://doi.org/10.1109/NEMS.2015.7147473 SF ELIB - SuUB Bremen
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