I agree that this site is using cookies. You can find further informations
here
.
X
Login
Merkliste (
0
)
Home
About us
Home About us
Our history
Profile
Press & public relations
Friends
The library in figures
Exhibitions
Projects
Training, internships, careers
Films
Services & Information
Home Services & Information
Lending and interlibrary loans
Returns and renewals
Training and library tours
My Account
Library cards
New to the library?
Download Information
Opening hours
Learning spaces
PC, WLAN, copy, scan and print
Catalogs and collections
Home Catalogs and Collections
Rare books and manuscripts
Digital collections
Subject Areas
Our sites
Home Our sites
Central Library
Law Library (Juridicum)
BB Business and Economics (BB11)
BB Physics and Electrical Engineering
TB Engineering and Social Sciences
TB Economics and Nautical Sciences
TB Music
TB Art & Design
TB Bremerhaven
Contact the library
Home Contact the library
Staff Directory
Open access & publishing
Home Open access & publishing
Reference management: Citavi & RefWorks
Publishing documents
Open Access in Bremen
zur Desktop-Version
Toggle navigation
Merkliste
1 Ergebnisse
1
The study of compensative structure assisted convex and con..:
, In:
10th IEEE International Conference on Nano/Micro Engineered and Molecular Systems
,
Yu-Hsin Lin
;
Yuan-Chieh Cheng
;
Nien-Nan Chu
... - p. 491-493 , 2015
Link:
https://doi.org/10.1109/NEMS.2015.7147475
RT T1
10th IEEE International Conference on Nano/Micro Engineered and Molecular Systems
: T1
The study of compensative structure assisted convex and concave corner structures etching by inductively coupled plasma-reactive ion etch (ICP-RIE)
UL https://suche.suub.uni-bremen.de/peid=ieee-7147475&Exemplar=1&LAN=DE A1 Yu-Hsin Lin A1 Yuan-Chieh Cheng A1 Nien-Nan Chu A1 Wensyang Hsu A1 Yu-Hsiang Tang A1 Po-Li Chen A1 Chih-Chung Yang A1 Ming-Hua Hsiao A1 Chien-Nan Hsiao YR 2015 K1 Etching K1 Plasmas K1 Silicon K1 Fabrication K1 Patents K1 Passivation K1 Sulfur hexafluoride K1 Convex and concave corner structures K1 compensative K1 Inductively-Coupled-Plasma Reactive-Ion-Etch (ICP-RIE) SP 491 OP 493 LK http://dx.doi.org/https://doi.org/10.1109/NEMS.2015.7147475 DO https://doi.org/10.1109/NEMS.2015.7147475 SF ELIB - SuUB Bremen
Export
RefWorks (nur Desktop-Version!)
Flow
(Zuerst in
Flow
einloggen, dann importieren)