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Fast and reliable charge-trap non-volatile memories using l..:
, In:
2015 IEEE 22nd International Symposium on the Physical and Failure Analysis of Integrated Circuits
,
Huang, Wen-Hsien
;
Yang, Chih-Chao
;
Hsieh, Tung-Ying
... - p. 392-394 , 2015
Link:
https://doi.org/10.1109/IPFA.2015.7224424
RT T1
2015 IEEE 22nd International Symposium on the Physical and Failure Analysis of Integrated Circuits
: T1
Fast and reliable charge-trap non-volatile memories using low thermal budget processes in monolithic 3DIC application
UL https://suche.suub.uni-bremen.de/peid=ieee-7224424&Exemplar=1&LAN=DE A1 Huang, Wen-Hsien A1 Yang, Chih-Chao A1 Hsieh, Tung-Ying A1 Wang, Hsing-Hsiang A1 Shen, Chang-Hong A1 Shieh, Jia-Min YR 2015 SN 1946-1542 SN 1946-1550 K1 Nonvolatile memory K1 Silicon K1 Logic gates K1 Grain size K1 Photonic band gap K1 Rough surfaces K1 Surface roughness SP 392 OP 394 LK http://dx.doi.org/https://doi.org/10.1109/IPFA.2015.7224424 DO https://doi.org/10.1109/IPFA.2015.7224424 SF ELIB - SuUB Bremen
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