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Rear side passivation characteristics of silicon oxy nitrid..:
, In:
2016 IEEE 43rd Photovoltaic Specialists Conference (PVSC)
,
Balaji, Nagarajan
;
Park, Cheolmin
;
Thanh Nguyen, Huong Thi
. - p. 3011-3014 , 2016
Link:
https://doi.org/10.1109/PVSC.2016.7750216
RT T1
2016 IEEE 43rd Photovoltaic Specialists Conference (PVSC)
: T1
Rear side passivation characteristics of silicon oxy nitride films for high efficiency silicon solar cell
UL https://suche.suub.uni-bremen.de/peid=ieee-7750216&Exemplar=1&LAN=DE A1 Balaji, Nagarajan A1 Park, Cheolmin A1 Thanh Nguyen, Huong Thi A1 Yi, Junsin YR 2016 K1 Films K1 Photovoltaic cells K1 Passivation K1 Refractive index K1 Silicon K1 Radiative recombination SP 3011 OP 3014 LK http://dx.doi.org/https://doi.org/10.1109/PVSC.2016.7750216 DO https://doi.org/10.1109/PVSC.2016.7750216 SF ELIB - SuUB Bremen
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