I agree that this site is using cookies. You can find further informations
here
.
X
Login
Merkliste (
0
)
Home
About us
Home About us
Our history
Profile
Press & public relations
Friends
The library in figures
Exhibitions
Projects
Training, internships, careers
Films
Services & Information
Home Services & Information
Lending and interlibrary loans
Returns and renewals
Training and library tours
My Account
Library cards
New to the library?
Download Information
Opening hours
Learning spaces
PC, WLAN, copy, scan and print
Catalogs and collections
Home Catalogs and Collections
Rare books and manuscripts
Digital collections
Subject Areas
Our sites
Home Our sites
Central Library
Law Library (Juridicum)
BB Business and Economics (BB11)
BB Physics and Electrical Engineering
TB Engineering and Social Sciences
TB Economics and Nautical Sciences
TB Music
TB Art & Design
TB Bremerhaven
Contact the library
Home Contact the library
Staff Directory
Open access & publishing
Home Open access & publishing
Reference management: Citavi & RefWorks
Publishing documents
Open Access in Bremen
zur Desktop-Version
Toggle navigation
Merkliste
1 Ergebnisse
1
Stability study of native epitaxial transistors as process ..:
, In:
2017 28th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
,
Agam, Moshe
;
Suwhanov, Agajan
;
Lee, Ashley
.. - p. 55-58 , 2017
Link:
https://doi.org/10.1109/ASMC.2017.7969198
RT T1
2017 28th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
: T1
Stability study of native epitaxial transistors as process probe for contamination detection
UL https://suche.suub.uni-bremen.de/peid=ieee-7969198&Exemplar=1&LAN=DE A1 Agam, Moshe A1 Suwhanov, Agajan A1 Lee, Ashley A1 Henninger, Josh A1 Hose, Sallie YR 2017 SN 2376-6697 K1 Contamination K1 Transistors K1 Tools K1 Resists K1 Implants K1 Threshold voltage K1 Epitaxial growth K1 Native transistors K1 multi-layer epitaxial K1 DTI K1 poly seam K1 phosphoric acid K1 H3PO4 K1 contamination K1 autodoping K1 high energy implants K1 resist penetration K1 shared tools. Hard mask removal SP 55 OP 58 LK http://dx.doi.org/https://doi.org/10.1109/ASMC.2017.7969198 DO https://doi.org/10.1109/ASMC.2017.7969198 SF ELIB - SuUB Bremen
Export
RefWorks (nur Desktop-Version!)
Flow
(Zuerst in
Flow
einloggen, dann importieren)