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1 Ergebnisse
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Characterization of thin carbonized photoresist layer and i..:
, In:
2017 28th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
,
Ryu, Je Hyeok
;
Kim, Byoung Hoon
;
Yoon, Sung Jin
- p. 102-106 , 2017
Link:
https://doi.org/10.1109/ASMC.2017.7969207
RT T1
2017 28th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
: T1
Characterization of thin carbonized photoresist layer and investigation of dry strip process through real-time monitored variable temperature control
UL https://suche.suub.uni-bremen.de/peid=ieee-7969207&Exemplar=1&LAN=DE A1 Ryu, Je Hyeok A1 Kim, Byoung Hoon A1 Yoon, Sung Jin YR 2017 SN 2376-6697 K1 Temperature measurement K1 Plasma temperature K1 Heating systems K1 Strips K1 Monitoring K1 Resists K1 photoresist dry strip K1 HDIS K1 pyrometer K1 real-time monitoring K1 plasma source SP 102 OP 106 LK http://dx.doi.org/https://doi.org/10.1109/ASMC.2017.7969207 DO https://doi.org/10.1109/ASMC.2017.7969207 SF ELIB - SuUB Bremen
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