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A study on film thickness control of vertical flow showerhe..:
, In:
2017 28th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
,
Lee, Guensuk
;
Kim, Suhong
;
Seok, Seunghyun
... - p. 217-221 , 2017
Link:
https://doi.org/10.1109/ASMC.2017.7969233
RT T1 <cTitle>2017 28th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)</cTitle>: T1 <Title>A study on film thickness control of vertical flow showerhead reactor for RF plasma deposition</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-7969233&Exemplar=1&LAN=DE A1 Lee, Guensuk A1 Kim, Suhong A1 Seok, Seunghyun A1 Lee, Junsung A1 Lee, Jinseok A1 Choi, Sangjin A1 Yoon, Taeyang A1 Park, Juhwan A1 Ko, Han Seo YR 2017 SN 2376-6697 K1 Showerhead K1 Gas Distribution Plate K1 PEALD K1 ACL K1 Uniformity K1 Open Area Ratio SP 217 OP 221 LK http://dx.doi.org/https://doi.org/10.1109/ASMC.2017.7969233 DO https://doi.org/10.1109/ASMC.2017.7969233 SF ELIB - SuUB Bremen
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