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1
In-line metrology for atomic resolution local height variat..:
, In:
2017 28th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
,
Kim, Tae-Gon
;
Kim, Soon-Wook
;
Vanderwayer, Tom
... - p. 267-272 , 2017
Link:
https://doi.org/10.1109/ASMC.2017.7969242
RT T1 <cTitle>2017 28th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)</cTitle>: T1 <Title>In-line metrology for atomic resolution local height variation</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-7969242&Exemplar=1&LAN=DE A1 Kim, Tae-Gon A1 Kim, Soon-Wook A1 Vanderwayer, Tom A1 Jo, Ah-Jin A1 Lee, Ju Suk A1 Ahn, Byoung-Woon A1 Zandiatashbar, Ardavan A1 Cho, Sang-Joon A1 Park, Sang-il A1 Irmer, Bernd A1 Schmidt, Sebastian YR 2017 SN 2376-6697 K1 Metrology K1 Reliability K1 Nails K1 Probes K1 Monitoring K1 Bonding K1 Semiconductor device measurement K1 Atomic force microscopy K1 Height K1 FinFET K1 3D interconnect K1 Wafer-to-wafer hybrid bonding K1 Local variation K1 Nanotopography K1 High density carbon tip SP 267 OP 272 LK http://dx.doi.org/https://doi.org/10.1109/ASMC.2017.7969242 DO https://doi.org/10.1109/ASMC.2017.7969242 SF ELIB - SuUB Bremen
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