I agree that this site is using cookies. You can find further informations
here
.
X
Login
Merkliste (
0
)
Home
About us
Home About us
Our history
Profile
Press & public relations
Friends
The library in figures
Exhibitions
Projects
Training, internships, careers
Films
Services & Information
Home Services & Information
Lending and interlibrary loans
Returns and renewals
Training and library tours
My Account
Library cards
New to the library?
Download Information
Opening hours
Learning spaces
PC, WLAN, copy, scan and print
Catalogs and collections
Home Catalogs and Collections
Rare books and manuscripts
Digital collections
Subject Areas
Our sites
Home Our sites
Central Library
Law Library (Juridicum)
BB Business and Economics (BB11)
BB Physics and Electrical Engineering
TB Engineering and Social Sciences
TB Economics and Nautical Sciences
TB Music
TB Art & Design
TB Bremerhaven
Contact the library
Home Contact the library
Staff Directory
Open access & publishing
Home Open access & publishing
Reference management: Citavi & RefWorks
Publishing documents
Open Access in Bremen
zur Desktop-Version
Toggle navigation
Merkliste
1 Ergebnisse
1
A case of charging induced damage into the common Metal Int..:
, In:
2017 IEEE 2nd International Conference on Opto-Electronic Information Processing (ICOIP)
,
Sub, Yoon Myung
;
Hian, Bernard Yap Tzen
;
Fong, Lee It
... - p. 83-86 , 2017
Link:
https://doi.org/10.1109/OPTIP.2017.8030704
RT T1 <cTitle>2017 IEEE 2nd International Conference on Opto-Electronic Information Processing (ICOIP)</cTitle>: T1 <Title>A case of charging induced damage into the common Metal Interconnect during Chemical Mechanical Polishing</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-8030704&Exemplar=1&LAN=DE A1 Sub, Yoon Myung A1 Hian, Bernard Yap Tzen A1 Fong, Lee It A1 Minhar, Ariffin Bin A1 Wui, Tan Kim A1 Jin, Looi Hui A1 Min, Foo Thai YR 2017 K1 Orifices K1 Electrostatic discharges K1 Spirals K1 Tools K1 Metals K1 Chemicals K1 Robots K1 chemical mechanical polishing (CMP) K1 electrostatic discharge (ESD) K1 design of experiments (DOE) K1 charging induced damage (CID) K1 de-ionized water (DIW) K1 Applied Materials Mirra-Mesa HCLU (Head Clean Load/Unload) SP 83 OP 86 LK http://dx.doi.org/https://doi.org/10.1109/OPTIP.2017.8030704 DO https://doi.org/10.1109/OPTIP.2017.8030704 SF ELIB - SuUB Bremen
Export
RefWorks (nur Desktop-Version!)
Flow
(Zuerst in
Flow
einloggen, dann importieren)
