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Dissolution and redeposition behavior of C/sub 60/ films:
, In:
International Conference on Science and Technology of Synthetic Metals
,
Wen-Jwn Wang
;
Rau-Shyi Chiu
;
Liang-Jye Yu
. - p. 416 , 1994
Link:
https://doi.org/10.1109/STSM.1994.835566
RT T1
International Conference on Science and Technology of Synthetic Metals
: T1
Dissolution and redeposition behavior of C/sub 60/ films
UL https://suche.suub.uni-bremen.de/peid=ieee-835566&Exemplar=1&LAN=DE A1 Wen-Jwn Wang A1 Rau-Shyi Chiu A1 Liang-Jye Yu A1 Bo-Cheng Wang YR 1994 K1 Electrodes K1 Chemistry K1 Casting K1 Transistors K1 Electrochemical processes K1 Doping K1 Quasi-doping K1 Morphology K1 Tunneling K1 Microscopy SP 416 LK http://dx.doi.org/https://doi.org/10.1109/STSM.1994.835566 DO https://doi.org/10.1109/STSM.1994.835566 SF ELIB - SuUB Bremen
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