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Improving the Resolution in Mask-Aligner Lithography:
, In:
2018 International Conference on Optical MEMS and Nanophotonics (OMN)
,
Vetter, Andreas
;
Kirner, Raoul
;
Scharf, Toralf
... - p. 1-5 , 2018
Link:
https://doi.org/10.1109/OMN.2018.8454655
RT T1 <cTitle>2018 International Conference on Optical MEMS and Nanophotonics (OMN)</cTitle>: T1 <Title>Improving the Resolution in Mask-Aligner Lithography</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-8454655&Exemplar=1&LAN=DE A1 Vetter, Andreas A1 Kirner, Raoul A1 Scharf, Toralf A1 Noell, Wilfried A1 Rockstuhl, Carsten A1 Voelkel, Reinhard YR 2018 K1 Lithography K1 Adaptive optics K1 Optical device fabrication K1 Optical diffraction K1 Lighting K1 Optimization K1 Optical distortion K1 Nanofabrication K1 Diode laser K1 Mask-aligner SP 1 OP 5 LK http://dx.doi.org/https://doi.org/10.1109/OMN.2018.8454655 DO https://doi.org/10.1109/OMN.2018.8454655 SF ELIB - SuUB Bremen
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