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Circuit Dependent Plasma Charging Effect Robustness in 0.16..:

, In: 2019 31st International Symposium on Power Semiconductor Devices and ICs (ISPSD),
Basso, Michele ; Riccardi, Damiano ; Martino, Antonino.. - p. 399-402 , 2019
Link: https://doi.org/10.1109/ISPSD.2019.8757635