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1 Ergebnisse
1
Planar 1.2kV SiC MOSFETs with retrograde channel profile fo..:
, In:
2019 31st International Symposium on Power Semiconductor Devices and ICs (ISPSD)
,
Knoll, L.
;
Mihaila, A.
;
Wirths, S.
... - p. 211-214 , 2019
Link:
https://doi.org/10.1109/ISPSD.2019.8757648
RT T1
2019 31st International Symposium on Power Semiconductor Devices and ICs (ISPSD)
: T1
Planar 1.2kV SiC MOSFETs with retrograde channel profile for enhanced ruggedness
UL https://suche.suub.uni-bremen.de/peid=ieee-8757648&Exemplar=1&LAN=DE A1 Knoll, L. A1 Mihaila, A. A1 Wirths, S. A1 Arango, Y. A1 Prasmusinto, A. A1 Bianda, E. A1 Kranz, L. A1 Bellini, M. A1 Romano, G. A1 Papadopoulos, C. YR 2019 SN 1946-0201 K1 MOSFET K1 Silicon carbide K1 Performance evaluation K1 Logic gates K1 Switches K1 Silicon K1 Vehicle dynamics K1 SiC MOSFET K1 planar cell K1 retrograde channel K1 ruggedness SP 211 OP 214 LK http://dx.doi.org/https://doi.org/10.1109/ISPSD.2019.8757648 DO https://doi.org/10.1109/ISPSD.2019.8757648 SF ELIB - SuUB Bremen
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