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Comparing RTA and Laser SPE & LPE Annealing of Ge-epi with ..:
, In:
2019 19th International Workshop on Junction Technology (IWJT)
,
Borland, John
;
Chaung, Shang-Shuin
;
Tseng, Tseung-Yuen
... - p. 1-4 , 2019
Link:
https://doi.org/10.23919/IWJT.2019.8802624
RT T1
2019 19th International Workshop on Junction Technology (IWJT)
: T1
Comparing RTA and Laser SPE & LPE Annealing of Ge-epi with Si, Sn & C Implantation for Well Mobility/Strain Engineering
UL https://suche.suub.uni-bremen.de/peid=ieee-8802624&Exemplar=1&LAN=DE A1 Borland, John A1 Chaung, Shang-Shuin A1 Tseng, Tseung-Yuen A1 Joshi, Abhijeet A1 Basol, Bulent A1 Lee, Yao-Jen A1 Kuroi, Takashi A1 Goodman, Gary A1 Khapochkina, Nadya A1 Buyuklimanli, Temel YR 2019 K1 Lasers K1 Annealing K1 Implants K1 Silicon K1 X-ray scattering K1 Measurement by laser beam K1 Germanium SP 1 OP 4 LK http://dx.doi.org/https://doi.org/10.23919/IWJT.2019.8802624 DO https://doi.org/10.23919/IWJT.2019.8802624 SF ELIB - SuUB Bremen
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